Influence of Thickness at High Deposition Temperature on Nanostructure of Titanium Dioxide Thin Layers

Abstract

Titanium dioxide thin layers at different 50, 100, and 150 nm thicknesses, under normal deposition angle, and the same deposition rate, were
deposited on glass substrates, at 250 ºC temperature, under UHV conditions. Their nanostructures were determined by AFM and XRD methods. 
 Roughness of the films changed by increasing film thickness. Reflectanceof the films were obtained using spectrophotometer method. High 
 deposition temperature and film thickness, play an important role on the nanostructure of the films.